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  State Key Laboratory on Advanced Displays and Optoelectronics Technologies


 


  1. Meng Zhang, Yan Yan, Sunbin Deng, Wei Zhou, Rongsheng Chen, Man Wong, and Hoi-Sing Kwok, “Characterization of Self-Aligned Top-Gate Microcrystalline Silicon Thin Film Transistors”, ICDT2018, pp. 650-652, 2018.
  2. Meng Zhang, Yan Yan, Wei Zhou, Rongsheng Chen, Sunbin Deng, Man Wong, and Hoi-Sing Kwok, “Degradation Behaviors of Driving Thin-Film Transistors in Active-Matrix Organic Light-Emitting Diode Displays”, EEE International Conference on Electron Devices and Solid-State Circuits, accepted.
  3. Xianda Zhou, Meng Zhang, Yitong Xu, Wei Zhou, Kai Wang, Arokia Nathan, Man Wong, Hoi-Sing Kwok, Hai Ou, Jun Chen, Shaozhi Deng and Ningsheng Xu, “Vertically Integrated Optical Sensor With Photoconductive Gain > 10 and Fill Factor > 70%”, IEEE Electron Device Lett., vol. 39, pp. 386-389, 2018.
  4. C.L. Meng, M.C. Tseng, S.T. Tang, and H.S. Kwok, “Optical rewritable liquid crystal displays without a front polarizer”, Optics Letters, 43(4):899-902, 2018.
  5. C.L. Meng, M.C. Tseng, S. T. Tang and H. S. Kwok, “Optical rewritable liquid crystal displays without a front polarizer”, ICDT, Guangzhou, 2018.
  6. Z. Feng, L. Lu,  S. Wang, et al., “Fluorination-Enabled Monolithic Integration of Enhancement- and Depletion-Mode Indium-Gallium-Zinc Oxide Thin-Film Transistors,” IEEE Electron Device Lett., vol. PP, no. 1, pp. 1-4, 2018.
  7. Y. Yang, D. Zhang, M. Wang, L. Lu, M. Wong, “Suppressed Degradation of Elevated-Metal Metal-Oxide Thin-Film Transistors Under Bipolar Gate Pulse Stress,” IEEE Electron Device Lett., vol. PP, no. 1, pp. 1-4, 2018.
  8. L. Lu, Z. Xia, J. Li, et al., “A Comparative Study on Fluorination and Oxidation of Indium-Gallium-Zinc Oxide Thin-Film Transistors,” IEEE Electron Device Lett., vol. 39, no. 2, pp. 196–199, Feb. 2018.
  9. Z. Xia, J. Li, L. Lu* (Invited Speaker), H. S. Kwok, M. Wong, “A Study on Self-Aligned Bottom-Gate Elevated-Metal Metal-Oxide Thin-Film Transistors,” Int. Thin-Film Transistor Conf., Guangzhou, pp. 67, Feb. 2018.
  10. E. Chan, D. Lin, L. Lu, et al., “Realization and Characterization of a Bulk-Type All-Silicon High Pressure Sensor,” J. Microelectromechanical Syst., vol. PP, no. 1, pp. 1-8, 2018.
  11. E. Chan, D. Lin, L. Lu, et al., “Trench-Isolated Bulk-Type Pressure Sensor on Silicon-on-Insulator for High-Temperature and High-Pressure Downhole Applications,” Hilton Head Workshop: A Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head Island (Carolina), Accepted, Jun. 2018.
  12. Zhibo SUN, Cuiling Meng, Jacob HO, Ken TSENG  and Hoi-Sing KWOK, “Fabrication of Broadband Quarter Wave Plate by Combination of Two Retardation Films Using Coating Technique”, ICDT2018, pp.288-290, 2018.

 

  1. H.S. Kwok, G. Li, J. Ho and M. Wong "Organic-Inorganic perovskite materials and optoelectronic devices fabricated by close space sublimation " (Ref: WO2017031193A1)
  2. M.C. Tseng, C.L. Meng, S.T. Tang, H.S. Kwok, “Haze Free Reverse Mode Liquid Crystal Light Control Film with Inhomogeneous Alignment layer”, US patent, 2017.
  3. CL Meng, MC Tseng, Su Pan, ST Tang, HS Kwok. Method of forming continuous axis varying polarizer and retarder for mechanical variable transmission windows. , US patent Application number: 62/606,340. 09/20/2017
  4. M.C. Tseng, C.L. Meng, S.T. Tang, H.S. Kwok. Haze free reverse mode liquid crystal light control film with inhomogeneous alignment layer. US patent Application number: 62/603,602. Date: 06/06/2017
  5. CL Meng, MC Tseng, Su Pan, ST Tang, HS Kwok. Method of forming continuous axis varying polarizer and retarder for mechanical variable transmission windows.  US patent Application number: 62/606,340 .Date: 09/20/2017
  6. CX Zhao, MC Tseng, CL Meng, ST Tang, HS Kwok. Materials and methods of making photo-aligned vertical alignment layer for liquid crystal devices. US patent Application number: 62/707,345. Date: 10/31/2017
  7. Z. Xia, L. Lu, M. Wong and H. S. Kwok, “Metal-Oxide Thin-Film Transistor and the Fabrication of the Same,” US Patent Provisional Application 62/605,322, Aug. 2017.
  8. L. Lu, Z. We, M. Wong and H. S. Kwok, “Integration of Silicon Thin-Film Transistors and Metal-Oxide Thin-Film Transistors,” US Patent Provisional Application 62/600, 281, Feb. 2017.
  9. L. Lu, Z. Xia, J. Li, M. Wong and H. S. Kwok, “Vertical Metal-Oxide Thin-Film Transistor with Multiple-Junction Channel and Method of Fabricating the Same,” US Patent Application 15/581,322, Apr. 2017.
  10. V. V. Vladimirovich, E. P. Pozhidaev, A. K. Srivastava, V. G. Chigrinov, H-S Kwok, A low birefringence ferroelectric liquid crystal mixture” Application Submitted to USPTO, JAN, 2017.
  11. M.C. Tseng, A.K. Srivastava, C.L. Meng, V.G. Chigrinov, and H.S. Kwok, “Thermally stabilized Polymer azo dye composite Photo-Alignment Layer”, US patent, 2016.
  12. Response enhanced bistable display through designed nucleation effect (Ref: TTC.PA.0916)
  13. Composite photo-alignment layer (US patent: No.62/285,435)
  14. L. Lu, M. Wong and H. S. Kwok, “Metal-Oxide Thin-Film Transistor with Channel, Source and Drain Regions Capped with Covers of Different Gas-Permeability and Method of Fabricating the Same,” US Patent Provisional Application, 2015.
  15. L. Lu, M. Wong and H. S. Kwok, “Metal-Oxide Thin-Film Transistor with Channel, Source and Drain Regions Capped with Covers of Different Gas-Permeability and Method of Fabricating the Same,” US Patent Application 61/967, 970, March 27, 2015.
  16. L. Lu, M. Wong and H. S. Kwok, “Metal-Oxide Thin-Film Transistor with Source and Drain Regions Doped at Room Temperature,” US Patent Application 14/617, 181, February 9, 2015.
  17. L. Lu, M. Wong and H. S. Kwok, “Metal-Oxide Thin-Film Transistor with Channel, Source and Drain Regions Capped with Covers of Different Gas-Permeability and Method of Fabricating the Same”, US Patent, Under Application, 2014.
  18. H. S. Kwok, M. Zhang, S. Chen, W. Zhou and M. Wong, “THIN FILM TRANSISTOR WITH TWO-DIMENSIONAL DOPING ARRAY”, US20140159039 A1.
  19. To Du, A. K. Srivastava, V. G. Chigrinov and H. S. Kwok, “100% broadband polarizer”, USPTO Application Filled USPTO, Aug 2014.
  20. E. P. Pozhidaev, A. K. Srivastava, V. G. Chigrinov, V. V. Vaschenko and H. S. Kwok, “Stressed Antiferroelectric liquid crystal cell”, USPTO Application Filled USPTO, June 2014.
  21. A. K. Srivastava, V. G. Chigrinov and H. S. Kwok, “2D/3D Switchable Liquid Crystal Lens Unit” USPTO Application Filled USPTO, May 2014.
  22. A. K. Srivastava, Xiaoqian Wang, V. G. Chigrinov and H. S. Kwok, “Transparent Liquid Crystal lens display” USPTO Application Filled USPTO, Dec  2013.
  23. A. K. Srivastava, Q. Guo, Ma Ying, V. G. Chigrinov, and H. S. Kwok, “Polymer Stabilized Electrically Suppressed Helix Ferroelectric Liquid crystal cell”, Filled USPTO Application no. 61/962,854, NOV 2013.
  24. A. K. Srivastava, Xiaoqian Wang,, V. G. Chigrinov, and H. S. Kwok, “Liquid Crystal Fresnel Lens” Filled USPTO Application No. US 61/958742 Aug 2013.
  25. Q. Guo, A. K. Srivastava, V. G. Chigrinov, and H. S. Kwok, “Liquid crystals photo-alignment layer”, Filled USPTO Application No. US 61/958,358, July 2013.



 

 
 

 

 

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